Name: Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Price: 209.87 EUR
Availability: InStock
Author: Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa)
ISBN: 9781032386706

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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Type

Physical Book

Publisher

Crc Press

Author

Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa)

Language

English

Pages

376

Format

Paperback

ISBN13

9781032386706

Edition No.

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa) (Author) · Crc Press · Paperback

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Synopsis "Machine Learning-Based Modelling in Atomic Layer Deposition Processes"

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa)

Synopsis "Machine Learning-Based Modelling in Atomic Layer Deposition Processes"

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